Thin Wall Tungsten Crucible
Thin wall tungsten crucible is high-temperature resistant container manufactured from high-purity tungsten materials through processes such as powder metallurgy sintering, precision spinning, and machining. Optimizing wall thickness structure, it enhances thermal response speed and temperature uniformity while ensuring mechanical strength, making it suitable for high-end, high-temperature process scenarios requiring precise thermal control.
Characteristics of CTIA's Thin Wall Tungsten Crucible
(1) High-Temperature Stability: The high melting point and low vapor pressure of tungsten enable the crucible to operate stably for extended periods in vacuum or protective atmospheres at temperatures ranging from 1800°C to 2600°C without easily deforming.
(2) Fast Thermal Response: The thin wall structure reduces thermal inertia, allowing for faster heating and cooling cycles, thereby improving temperature control accuracy and process efficiency.
(3) High Purity and Low Contamination: Utilizing high-purity tungsten material combined with precision machining and cleaning processes effectively minimizes the risk of introducing impurities, making it ideal for the preparation of high-purity materials.
(4) Uniform Thermal Field: The uniform wall thickness design optimizes the heat conduction path, rendering the temperature distribution more stable and reducing localized temperature fluctuations.
Applications of CTIA's Thin Wall Tungsten Crucible
(1) Sapphire Single Crystal Growth: Used in crystal growth furnaces to increase thermal field response speed and temperature uniformity, thereby enhancing crystal quality.
(2) High-Purity Metal Smelting: Used in high-temperature smelting and purification processes of materials such as tungsten, molybdenum, tantalum, niobium, and rare earth metals, reducing impurity introduction and maintaining high melt purity.
(3) Vacuum Evaporation Coating: Used as evaporation source vessel in electron beam evaporation and thermal evaporation deposition processes, guaranteeing high-temperature evaporation process stability and deposition uniformity.
(4) Semiconductor Material Preparation: Used for material synthesis and crystal growth control in high-temperature vacuum environments, improving thermal field stability and process consistency.
(5) High-Temperature Scientific Research: Used in high-temperature reactions, material analysis, and extreme thermal environment simulation experiments, raising experimental stability and repeatability.
Specifications of CTIA's Thin Wall Tungsten Crucible
(1) Purity: W ≥ 99.95%
(2) Density: ≥ 18.5 g/cm³
(3) Dimensions: diameter of 10–300 mm, height of 20–500 mm, wall thickness of 1–20 mm
(4) Type: Cylindrical, tapered, and customized structures
(5) Surface Treatment: Precision machining, ultrasonic cleaning, chemical cleaning
(6) Working Environment: Vacuum or inert atmosphere
(7) Customization: CTIA provides flexible customization services
With over 30 years of deep expertise in tungsten crucible manufacturing, CTIA GROUP consistently provides high-response, high-density customized tungsten crucible solutions for vacuum coating, semiconductors, precision smelting, and scientific research. Every tungsten crucible produced by CTIA undergoes rigorous quality control, from sheet selection and spinning forming to inspection, ensuring long-term, stable performance under complex, high-temperature operating conditions.
For any inquiry, please contact tungsten crucible manufacturer: CTIA GROUP
Email: sales@chinatungsten.com
Tel: 0086 592 5129696 / 0086 592 5129595
Website: www.tungsten.com.cn
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